E3S Web Conf.
Volume 12, 2016i-DUST 2016 – Inter-Disciplinary Underground Science & Technology
|Number of page(s)||6|
|Section||Microelectronics Materials, Devices and Systems|
|Published online||05 December 2016|
Statistical investigations of an ENIG Nickel film morphology by Atomic Force Microscopy
1 Normandie Université ENSICAEN / CRISMAT / UMR 6508, 6 boulevard Maréchal Juin, 14050 Caen Cedex 04, France
2 Service de Chimie des Matériaux Nouveaux, CIRMAP, Université de Mons, Belgium
3 CRISMAT, Normandie Université, UMR CNRS 6508, 14000 Caen, France
4 IPDiA, 2 rue de la girafe, 14000 Caen, France
The morphology of a Nickel layer grown by an Electroless Nickel Immersion Gold (ENIG) technique used for microelectronics interconnections is determined by Atomic Force Microscopy (AFM) investigations. The root mean square (rms) roughness, determined over a scanned area is a function of the AFM scanned area size. In this work, we propose to consider the dynamic scale theory and the power spectrum density (PSD) analysis in order to perform a comprehensive determination of the surface properties of the ENIG nickel layer. Results highlight the existence of a first regime with a roughness exponent of 0.95 and a fractal dimension (DF) of the nickel film about 2.05. This case study is presented in order to propose further investigations. In fact, same experimental procedure should be performed in a magnetic shielded zone where a very low noise level is available such as the Low-Noise Underground Laboratory (LSBB) of Rustrel (France).
© The Authors, published by EDP Sciences 2016
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0 (http://creativecommons.org/licenses/by/4.0/).